ALEXANDRIA, Va., Aug. 5 -- United States Patent no. 12,697,658, issued on Aug. 4, was assigned to Tosoh SMD Inc. (Grove City, Ohio).
"Tungsten-boron sputter targets and films made thereby" was invented by Eugene Y. Ivanov (Grove City, Ohio) and Eduardo del Rio (Dublin, Ohio).
According to the abstract* released by the U.S. Patent & Trademark Office: "A Me-B based alloy spherical powder for use in a sputtering target including a metal powder selected from the group consisting of: Mo, W, Ta, Nb, Hf and Ti; a BN powder; and optionally a binary or ternary compound powder, as well as W/B sputter targets, alloys, and barrier/seed films made by such targets. A combined diffusion barrier layer is provided by sputter coating of a W/B sputter targe...