US Patent Issued to TOKYO OHKA KOGYO on Sept. 8 for "Photosensitive composition" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,730,376, issued on Sept. 8, was assigned to TOKYO OHKA KOGYO Co. LTD. (Kanagawa, Japan).

"Photosensitive composition" was invented by Kazuki Urakawa (Kanagawa, Japan), Takuro Asaba (Kanagawa, Japan), Hideki Saijyo (Kanagawa, Japan) and Hiroki Chisaka (Kanagawa, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided are a highly-curable photosensitive composition capable of forming cured products that are less likely to undergo excessive mass loss even when heated; and a product of curing of such a photosensitive composition. The photosensitive composition includes photopolymerizable compounds (A) and an initiating agent (C), in which the photopol...