US Patent Issued to Tokyo Electron on Sept. 8 for "Plasma processing apparatus and plasma processing method" (Japanese Inventor)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,729,440, issued on Sept. 8, was assigned to Tokyo Electron Ltd. (Tokyo).

"Plasma processing apparatus and plasma processing method" was invented by Hiroyuki Matsuura (Iwate, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing apparatus includes a processing container having an opening in a sidewall, a partition wall configured to cover the opening and to define an internal space communicating with an inside of the processing container, a processing gas supply configured to supply a processing gas to the internal space, a pair of electrodes provided on outer surfaces of opposing sidewalls of the partition wall, and a shutter mechanis...