US Patent Issued to Tokyo Electron on Sept. 8 for "Plasma measuring method and plasma processing apparatus" (Japanese Inventor)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,731,772, issued on Sept. 8, was assigned to Tokyo Electron Ltd. (Tokyo).

"Plasma measuring method and plasma processing apparatus" was invented by Mitsutoshi Ashida (Yamanashi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a plasma measuring method for measuring a plasma state using a probe device disposed at a plasma processing apparatus and a measuring circuit including a signal transmitter that outputs an AC voltage, the method comprising: measuring a first current in the measuring circuit when the AC voltage is outputted from the signal transmitter to the probe device in a state where plasma is not generated in the plasma processi...