US Patent Issued to Tokyo Electron on Sept. 8 for "Method for semiconductor processing" (New York Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,414, issued on Sept. 8, was assigned to Tokyo Electron Ltd. (Tokyo).

"Method for semiconductor processing" was invented by Hunter Frost (Albany, N.Y.), Kandabara Tapily (Albany, N.Y.) and Tek Po Rinus Lee (Albany, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for semiconductor processing includes forming a first film over a first region of a substrate. A second region of the substrate remains substantially free of the first film. The second region is adjacent to the first region. The method further includes performing a plasma treatment over the substrate and selectively depositing a second film over the first film. The first film blo...