US Patent Issued to Tokyo Electron on Sept. 8 for "Gas supply amount calculation method and semiconductor device manufacturing method" (Japanese Inventor)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,729,436, issued on Sept. 8, was assigned to Tokyo Electron Ltd. (Tokyo).

"Gas supply amount calculation method and semiconductor device manufacturing method" was invented by Kouichi Sekido (Nirasaki, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Gas supply amount calculation method includes: calculating flow rate of first substance gas by subtracting flow rate of second substance gas from flow rate of mixed gas of the first and second substance gas flowing through gas supply path connected to processing container configured to perform film formation by atomic layer deposition method; calculating first integrated flow rate of the first substance g...