US Patent Issued to Tokyo Electron on Sept. 8 for "Film forming method and film forming apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,729,426, issued on Sept. 8, was assigned to Tokyo Electron Ltd. (Tokyo).

"Film forming method and film forming apparatus" was invented by Shota Ishibashi (Yamanashi, Japan) and Toru Kitada (Yamanashi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "There is a method for forming a film including an alloy film containing multiple types of elements on a surface of a substrate using a film forming target made of the alloy film, comprising: (a) arranging the film forming target and a distribution improvement target; and (b) forming the film on the substrate by simultaneously or alternately sputtering the film forming target and the distribution improvem...