US Patent Issued to Tokyo Electron on Sept. 29 for "Substrate liquid processing apparatus and substrate liquid processing method" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,747,504, issued on Sept. 29, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate liquid processing apparatus and substrate liquid processing method" was invented by Satoshi Kaneko (Koshi, Japan) and Kazuki Motomatsu (Koshi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate liquid processing apparatus includes a substrate holder configured to hold a substrate; a processing liquid supply configured to supply a processing liquid to an upper surface of the substrate held by the substrate holder; a cover body configured to cover the upper surface of the substrate held by the substrate holder; and a gas supply configured to supply an inert...