US Patent Issued to Tokyo Electron on Sept. 29 for "Plasma processing apparatus" (Japanese Inventor)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,749,650, issued on Sept. 29, was assigned to Tokyo Electron Ltd. (Tokyo).

"Plasma processing apparatus" was invented by Yohei Yamazawa (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing apparatus is provided. The apparatus comprises: a chamber accommodating a substrate; a window member forming an upper portion of the chamber; a gas inlet port disposed in at least one of a sidewall of the chamber and the window member, and configured to supply a gas into the chamber; and an antenna disposed above the chamber with the window member interposed therebetween, having a linear shape and made of a conductive material, and configu...