US Patent Issued to Tokyo Electron on Sept. 29 for "Gas supply system, gas control system, plasma processing apparatus, and gas control method" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,749,657, issued on Sept. 29, was assigned to Tokyo Electron Ltd. (Tokyo).

"Gas supply system, gas control system, plasma processing apparatus, and gas control method" was invented by Atsushi Sawachi (Miyagi, Japan), Kota Ishiharada (Miyagi, Japan), Hideaki Yakushiji (Miyagi, Japan), Yoshiyasu Sato (Miyagi, Japan), Shinya Morikita (Miyagi, Japan), Shota Yoshimura (Miyagi, Japan), Toshihiro Tsuruta (Miyagi, Japan) and Kazuaki Takaai (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A gas supply system includes: gas supply flow paths for independently supplying gas to a processing chamber; a flow rate controller arranged in each gas supply flo...