US Patent Issued to Tokyo Electron on Sept. 22 for "Processing method and processing system" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,745,588, issued on Sept. 22, was assigned to Tokyo Electron Ltd. (Tokyo).

"Processing method and processing system" was invented by Hayato Tanoue (Kumamoto, Japan), Yohei Yamashita (Kumamoto, Japan) and Yasutaka Mizomoto (Kumamoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A processing method of processing a combined substrate in which a first substrate and a second substrate are bonded to each other includes acquiring layer information of the combined substrate; forming a non-bonding region in which bonding strength between the first substrate and the second substrate is reduced, by radiating laser light in a pulse shape to a laser absorpti...