US Patent Issued to Tokyo Electron on Sept. 22 for "Plasma processing apparatus and gas supply method" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,744,190, issued on Sept. 22, was assigned to Tokyo Electron Ltd. (Tokyo).

"Plasma processing apparatus and gas supply method" was invented by Kota Shihommatsu (Miyagi, Japan), Takashi Aramaki (Miyagi, Japan) and Lifu Li (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "There is provided a plasma processing apparatus comprising: a plasma processing chamber having a substrate support configured to support a substrate; a shower head having a plurality of gas inlets configured to introduce a gas into respective regions in the plasma processing chamber; a gas supply configured to supply a gas to the plurality of gas inlets; a plasma generator co...