ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,744,187, issued on Sept. 22, was assigned to Tokyo Electron Ltd. (Tokyo).
"Plasma processing apparatus" was invented by Kazushi Kaneko (Yamanashi, Japan), Hiroshi Kondo (Tokyo), Eiki Kamata (Yamanashi, Japan) and Satoru Kawakami (Yamanashi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "There is a plasma processing apparatus comprising: a processing chamber configured to provide a processing space; an electromagnetic wave generator configured to generate electromagnetic waves for plasma excitation supplied to the processing space; a dielectric provided with a first surface facing the processing space; and an electromagnetic wave supply portion co...