US Patent Issued to Tokyo Electron on Oct. 6 for "Plasma processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,755,937, issued on Oct. 6, was assigned to Tokyo Electron Ltd. (Tokyo).

"Plasma processing apparatus" was invented by Nozomu Nagashima (Miyagi, Japan), Daisuke Yoshikoshi (Miyagi, Japan) and Kunihiko Yamagata (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a plasma processing apparatus comprising: a plasma processing chamber; a substrate support; a high frequency power supply; an electrode or an antenna electrically connected to the high frequency power supply; a power consuming member disposed within the plasma processing chamber or the substrate support; an electricity storage unit electrically connected to the power consuming...