US Patent Issued to Tokyo Electron on Oct. 6 for "Plasma processing apparatus" (Japanese Inventor)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,755,940, issued on Oct. 6, was assigned to Tokyo Electron Ltd. (Tokyo).

"Plasma processing apparatus" was invented by Mitsutoshi Ashida (Yamanashi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing apparatus is provided in one exemplary embodiment. A microwave output device of the plasma processing apparatus is configured to output microwaves that are provided into a chamber, and a controller is configured to control the operation of the microwave output device. The microwaves outputted by the microwave output device include an output wave for transmitting a power used for plasma generation, and a broadband sweep wave group used fo...