US Patent Issued to Tokyo Electron on Oct. 6 for "Plasma processing apparatus" (Japanese Inventor)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,755,939, issued on Oct. 6, was assigned to Tokyo Electron Ltd. (Tokyo).

"Plasma processing apparatus" was invented by Masaki Hirayama (Fuchu City, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing apparatus, includes: a chamber providing a processing space; a substrate support inside the processing space; an upper electrode provided above the substrate support via the processing space; an emitter emitting electromagnetic waves into a plasma generating space and extending in a circumferential direction around a central axis of the chamber; and a waveguide supplying the electromagnetic waves to the emitter, wherein the waveguide incl...