US Patent Issued to Tokyo Electron on Oct. 6 for "Modification method and modification device" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,755,941, issued on Oct. 6, was assigned to Tokyo Electron Ltd. (Tokyo).

"Modification method and modification device" was invented by Takafumi Nogami (Nirasaki, Japan) and Kenichi Kote (Nirasaki, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of modifying a film formed on a substrate, includes: generating plasma by a microwave in an interior of a processing container in which a stage on which a substrate is placed is provided; and periodically applying a DC voltage to the stage in the interior of the processing container in which the plasma is generated by the generating the plasma, and irradiating the substrate with electrons in the plasm...