US Patent Issued to Tokyo Electron on Oct. 27 for "Systems and methods for determining a localized fluid velocity of a processing liquid dispensed on a spinning substrate by tracking movement of an induced perturbation in the processing liquid across the spinning substrate" (Texas, New York Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,777,881, issued on Oct. 27, was assigned to Tokyo Electron Ltd. (Tokyo).

"Systems and methods for determining a localized fluid velocity of a processing liquid dispensed on a spinning substrate by tracking movement of an induced perturbation in the processing liquid across the spinning substrate" was invented by Michael Carcasi (Austin, Texas) and Robert Brandt (Albany, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Systems and methods are provided to control operational parameter(s) of a spin-on process based on a localized fluid velocity of a processing liquid dispensed onto a surface of a spinning semiconductor substrate. In the present disclosu...