US Patent Issued to Tokyo Electron on Oct. 27 for "Substrate treatment system" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,776,479, issued on Oct. 27, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate treatment system" was invented by Toshiki Akama (Miyagi, Japan), Shusei Kato (Miyagi, Japan), Gyeong min Park (Miyagi, Japan), Nobutaka Sasaki (Miyagi, Japan), Takashi Aramaki (Miyagi, Japan) and Lifu Li (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing system comprising: a plasma processing apparatus; a depressurization transfer device having a transfer robot and an edge ring; and a controller is disclosed. The plasma processing apparatus includes: a depressurizable processing chamber; a substrate support table; a lifting mechanism; a ...