US Patent Issued to Tokyo Electron on Oct. 20 for "Plasma processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,825, issued on Oct. 20, was assigned to Tokyo Electron Ltd. (Tokyo).

"Plasma processing apparatus" was invented by Yasuaki Taniike (Nirasaki City, Japan) and Masaki Hirayama (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "In a disclosed plasma processing apparatus, a metallic gas pipe extends in a direction crossing a coaxial waveguide and is connected to an inner conductor of the coaxial waveguide between one end and the other end of the inner conductor. The gas pipe is connected to a gas flow path of the inner conductor. The plasma processing apparatus includes a filter configured to prevent electromagnetic waves from propagating around the ...