US Patent Issued to Tokyo Electron on Nov. 3 for "Substrate processing apparatus and temperature regulation method" (Japanese Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,787,688, issued on Nov. 3, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate processing apparatus and temperature regulation method" was invented by Tatsuya Watanabe (Yamanashi, Japan) and Yuichi Takenaga (Yamanashi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus includes: a processing container, a temperature adjustment furnace, and a controller. The temperature controller includes at least one of a ceiling heater heating the processing container from a ceiling and a lower heater heating a portion below the processing container. The controller calculates a temperature condition for each of the plurality of zo...