US Patent Issued to Tokyo Electron on Nov. 3 for "Selective deposition on an existing patterned mask" (New York Inventor)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,787,725, issued on Nov. 3, was assigned to Tokyo Electron Ltd. (Tokyo).

"Selective deposition on an existing patterned mask" was invented by Alec Dorfner (Albany, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for processing a substrate includes receiving the substrate on a substrate holder disposed in a processing chamber, the substrate including a layer to be processed and a patterned mask disposed over the layer to be processed. The method further includes flowing a processing gas into the processing chamber, and replacing a material of the patterned mask with a metal of the processing gas to form a metal patterned mask occupying a same ...