ALEXANDRIA, Va., May 5 -- United States Patent no. 12,620,555, issued on May 5, was assigned to Tokyo Electron Ltd. (Tokyo).

"Systems and methods for plasma process" was invented by Charles Schlechte (Austin, Texas), Jianping Zhao (Austin, Texas), John Carroll (Austin, Texas) and Peter Lowell George Ventzek (Austin, Texas).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of performing a plasma process includes generating, at an output of a signal generator, a first RF signal at a first frequency. The signal generator is coupled to a plasma chamber through a matching circuit. Based on a feedback from the first RF signal, variable components of the matching circuit are moved to fixed positions. A second ...