US Patent Issued to Tokyo Electron on May 5 for "Substrate processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,620,565, issued on May 5, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate processing apparatus" was invented by Tatsuya Yamaguchi (Nirasaki, Japan) and Syuji Nozawa (Nirasaki, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus includes: a processing container; a stage provided in an interior of the processing container to place a substrate on the stage; an exhaust space arranged around the stage along an inner wall of the processing container; a first exhaust path provided between a processing space above the stage and the exhaust space and having a smaller conductance than the processing space; and a second exha...