US Patent Issued to Tokyo Electron on May 5 for "Selective non-plasma deposition of mask protection material" (New York Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,618,154, issued on May 5, was assigned to Tokyo Electron Ltd. (Tokyo).

"Selective non-plasma deposition of mask protection material" was invented by Yu-Hao Tsai (Albany, N.Y.), Du Zhang (Albany, N.Y.) and Peter Biolsi (Albany, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for selectively depositing a mask protection material using non-plasma treatments includes performing a non-plasma vapor treatment and performing a non-plasma halide treatment. During the non-plasma vapor treatment, a mask having openings exposing an underlying layer is treated with a non-plasma vapor to selectively deposit a first component of a mask protection material o...