US Patent Issued to Tokyo Electron on May 5 for "Plasma processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,620,557, issued on May 5, was assigned to Tokyo Electron Ltd. (Tokyo).

"Plasma processing apparatus" was invented by Syouji Yamagishi (Nirasaki, Japan), Hiroki Ehara (Nirasaki, Japan), Hiroyuki Hayashi (Nirasaki, Japan) and Jun Nakagomi (Nirasaki, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing apparatus includes a process container, a power supply configured to supply radio frequency or microwave power for generating plasma in the process container, a plurality of gas nozzles, each having a gas flow passage therein, and a plurality of protrusions formed integrally with a ceiling wall and/or a sidewall that defines the process con...