US Patent Issued to Tokyo Electron on May 19 for "Substrate processing system, substrate processing method, and map creating device" (Japanese Inventor)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,635,457, issued on May 19, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate processing system, substrate processing method, and map creating device" was invented by Takeshi Akimoto (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing system, includes: a measurement device configured to measure errors of substrates after the substrates are subjected to processing of a first process by a first processing apparatus; a transfer device configured to transfer the substrates between apparatuses including the first processing apparatus, a second processing apparatus that performs processing of a second process after the first proce...