US Patent Issued to Tokyo Electron on May 19 for "Substrate processing apparatus and substrate processing method" (Japanese Inventor)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,635,446, issued on May 19, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate processing apparatus and substrate processing method" was invented by Yasuo Kiyohara (Kumamoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus includes: a processing container including an internal space where a supercritical drying process is performed on a substrate having a surface to which a liquid is attached, by using a processing fluid in a supercritical state; a housing including a processing region where the processing container is disposed, and a carry-in/out region where carry-in/out of the substrate is performed; a deliver...