US Patent Issued to Tokyo Electron on May 12 for "Substrate processing apparatus and substrate processing method" (Japanese Inventor)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,625,437, issued on May 12, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate processing apparatus and substrate processing method" was invented by Shinichi Machidori (Kumamoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus includes: a base including a drive mechanism; a cover enclosing the base; a lifting body protruding from an internal region enclosed by the cover to an external region outside the internal region, and moving up and down with respect to the base by the drive mechanism; a processing body that is connected to the lifting body in the external region, and processes a substrate; and a suction tub...