US Patent Issued to Tokyo Electron on May 12 for "Substrate processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,624,453, issued on May 12, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate processing apparatus" was invented by Naoki Umehara (Nirasaki, Japan), Syuji Nozawa (Nirasaki, Japan), Ryohei Yoneda (Nirasaki, Japan) and Tatsuya Yamaguchi (Nirasaki, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus includes: a processing container; a stage provided inside the processing container to place a substrate thereon; an exhaust port arranged around the stage along an inner wall of the processing container; a driver configured to move the stage up and down between a processing position and a transfer position lower than the pr...