ALEXANDRIA, Va., May 12 -- United States Patent no. 12,625,432, issued on May 12, was assigned to Tokyo Electron Ltd. (Tokyo).
"Methods of forming patterns" was invented by Daniel Fulford (Cohoes, N.Y.), Jodi Grzeskowiak (Schenectady, N.Y.), H. Jim Fulford (Albany, N.Y.), Sean Smith (Cohasset, Mass.), Partha Mukhopadhyay (Orlando, Fla.), Michael Murphy (Albany, N.Y.) and Anton deVilliers (Clifton Park, N.Y.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method of forming sub-resolution features that includes: exposing a photoresist layer formed over a substrate to a first ultraviolet light (UV) radiation having a first wavelength of 365 nm or longer through a mask configured to form features at a first cri...