US Patent Issued to Tokyo Electron on March 3 for "Non-destructive coupon generation via direct write lithography for semiconductor process development" (New York Inventor)

ALEXANDRIA, Va., March 3 -- United States Patent no. 12,566,383, issued on March 3, was assigned to Tokyo Electron Ltd. (Tokyo).

"Non-destructive coupon generation via direct write lithography for semiconductor process development" was invented by Anthony R. Schepis (Albany, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of processing a substrate that includes: depositing a photoresist layer over the substrate; performing a cyclic direct-write lithographic process using a direct-write lithography tool, the cyclic direct-write lithographic process including a plurality of cycles, each of the plurality of cycles including: exposing the photoresist layer to a patterned actinic radiation without us...