US Patent Issued to Tokyo Electron on March 3 for "Focus ring replacement method and plasma processing system" (Japanese Inventor)

ALEXANDRIA, Va., March 3 -- United States Patent no. 12,567,568, issued on March 3, was assigned to Tokyo Electron Ltd. (Tokyo).

"Focus ring replacement method and plasma processing system" was invented by Shigeru Ishizawa (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method performed by a processor of a plasma processing system including a transfer device and a plasma processing apparatus that includes a process chamber. The process chamber includes a mount table on a surface of which a first focus ring is placed. The method includes controlling the transfer device to transfer the first focus ring out of the process chamber without opening the process chamber to the atmosphere; after the f...