US Patent Issued to Tokyo Electron on March 24 for "Gate valve apparatus and semiconductor manufacturing apparatus" (Japanese Inventor)

ALEXANDRIA, Va., March 24 -- United States Patent no. 12,588,459, issued on March 24, was assigned to Tokyo Electron Ltd. (Tokyo).

"Gate valve apparatus and semiconductor manufacturing apparatus" was invented by Masahiro Dogome (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A gate valve apparatus and a semiconductor manufacturing apparatus, in which a volume of a drive portion for driving a valve body is reduced, are provided. The gate valve apparatus includes a housing having an opening, a valve body configured to open and close the opening, and a drive portion configured to drive the valve body, in which the drive portion includes a first crankshaft including a first input shaft rotatably su...