US Patent Issued to Tokyo Electron on March 24 for "Gas processing apparatus and substrate processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., March 24 -- United States Patent no. 12,582,942, issued on March 24, was assigned to Tokyo Electron Ltd. (Tokyo).

"Gas processing apparatus and substrate processing apparatus" was invented by Keisuke Tsugao (Koshi City, Japan) and Daisuke Aoki (Koshi City, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A gas processing apparatus includes a duct, a partition plate and a liquid supply. The duct has therein a flow path through which a gas passes. The partition plate is configured to divide the flow path into multiple spaces, and is formed of a porous material, through which the gas passes, configured to retain a liquid. The liquid supply is configured to supply a dissolving liquid configu...