US Patent Issued to Tokyo Electron on June 9 for "Film forming method and film forming device" (Japanese, South Korean Inventors)

ALEXANDRIA, Va., June 9 -- United States Patent no. 12,649,971, issued on June 9, was assigned to Tokyo Electron Ltd. (Tokyo).

"Film forming method and film forming device" was invented by Shuji Azumo (Yamanashi, Japan), Sena Fujita (Yamanashi, Japan), Tadashi Mitsunari (Yamanashi, Japan), Yumiko Kawano (Yamanashi, Japan) and Shinichi Ike (Gyeonggi-do, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A film forming method includes: (A) preparing a substrate with a surface having a first region where a first film is exposed, and a second region where a second film formed by a material different from the first film is exposed; (B) forming a stepped portion in the surface such that the first region be...