ALEXANDRIA, Va., July 16 -- United States Patent no. 12,669,463, issued on June 30, was assigned to Tokyo Electron Ltd. (Tokyo).
"Inspection apparatus and inspection method" was invented by Shinjiro Watanabe (Yamanashi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An inspection apparatus for electrical inspection of a substrate is provided. The inspection apparatus includes: a probe card including a plurality of probes; a stage on which the substrate is placed, the stage being configured to move the substrate relative to the probe card and to bring the substrate into contact with the probes; and a controller configured to control a movement of the stage. The controller calculates, using a first displ...