ALEXANDRIA, Va., July 16 -- United States Patent no. 12,672,503, issued on June 30, was assigned to Tokyo Electron Ltd. (Tokyo).

"Developing apparatus" was invented by Shinsuke Takaki (Kumamoto, Japan), Hiroki Tadatomo (Tokyo), Yoji Sakata (Kumamoto, Japan), Tomoya Onitsuka (Kumamoto, Japan) and Naoki Shibata (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing system provided with a plurality of apparatuses to perform a patterning on a plurality of the substrates, wherein a transfer container accommodating the plurality of substrates is transferred to the plurality of apparatuses in a sequential manner. The substrate processing system includes: a first apparatus of the plurality of a...