US Patent Issued to Tokyo Electron on June 30 for "Antenna for inductively coupled plasma excitation, antenna unit for inductively coupled plasma excitation, and plasma processing apparatus" (Japanese Inventor)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,671,057, issued on June 30, was assigned to Tokyo Electron Ltd. (Tokyo).

"Antenna for inductively coupled plasma excitation, antenna unit for inductively coupled plasma excitation, and plasma processing apparatus" was invented by Yohei Yamazawa (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to an antenna for inductively coupled plasma excitation. The antenna comprises: a conductive plate; a plurality of coil assemblies, one end of each of the plurality of coil assemblies being connected to the conductive plate; and an impedance adjusting part disposed between the other end of each of the plurality of coil as...