US Patent Issued to Tokyo Electron on July 28 for "Substrate processing method, substrate processing apparatus, and computer-readable recording medium" (Japanese Inventor)

ALEXANDRIA, Va., July 28 -- United States Patent no. 12,696,709, issued on July 28, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate processing method, substrate processing apparatus, and computer-readable recording medium" was invented by Tsunemoto Ogata (Koshi City, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing method includes forming, by supplying a cleaning liquid, a liquid film of the cleaning liquid on the substrate; forming, by supplying a rinse liquid, a liquid film of the rinse liquid on the substrate, after the forming of the liquid film of the cleaning liquid; forming, by supplying a first organic solvent, a liquid film of the first organic solvent on the subst...