US Patent Issued to Tokyo Electron on July 14 for "Plasma processing method and plasma processing system" (Japanese Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,685,054, issued on July 14, was assigned to Tokyo Electron Ltd. (Tokyo).

"Plasma processing method and plasma processing system" was invented by Maju Tomura (Kurokawa-gun, Japan), Kae Takahashi (Kurokawa-gun, Japan) and Yoshihide Kihara (Kurokawa-gun, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing method performed in a plasma processing apparatus having a chamber is provided. This method comprises: (a) providing a substrate to a substrate support in the chamber, the substrate having a silicon-containing film and a mask film over the silicon-containing film; (b) supplying a processing gas to the chamber, the processing gas inclu...