US Patent Issued to Tokyo Electron on July 14 for "Apparatus for processing substrate and method of transferring substrate" (Japanese Inventor)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,685,092, issued on July 14, was assigned to Tokyo Electron Ltd. (Tokyo).

"Apparatus for processing substrate and method of transferring substrate" was invented by Takehiro Shindo (Nirasaki City, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An apparatus for transferring a substrate to a substrate processing chamber includes: a substrate transfer chamber including a floor surface portion having a traveling surface-side magnet provided therein and a sidewall portion having an opening for transferring the substrate therethrough; a substrate transfer module including a substrate holder and a floating body-side magnet acting a repulsive force with the...