US Patent Issued to Tokyo Electron on Feb. 24 for "Prediction method and information processing apparatus for predicting the process result in a plasma etching process" (Japanese, American Inventors)

ALEXANDRIA, Va., Feb. 24 -- United States Patent no. 12,562,352, issued on Feb. 24, was assigned to Tokyo Electron Ltd. (Tokyo).

"Prediction method and information processing apparatus for predicting the process result in a plasma etching process" was invented by Keita Yaegashi (Miyagi, Japan), Joji Takayoshi (Miyagi, Japan), Takayuki Suzuki (Miyagi, Japan), Ryohei Takeda (Miyagi, Japan), Soya Todo (Boise, Idaho), Yusuke Saitoh (Miyagi, Japan) and Takaharu Saino (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A prediction method includes a calculation process and a prediction process. The calculation process calculates a correlation between a spatial distribution value of a magnetic field in a ...