US Patent Issued to Tokyo Electron on Feb. 24 for "Plasma processing method and plasma processing device" (Japanese Inventor)

ALEXANDRIA, Va., Feb. 24 -- United States Patent no. 12,562,343, issued on Feb. 24, was assigned to Tokyo Electron Ltd. (Tokyo).

"Plasma processing method and plasma processing device" was invented by Taro Ikeda (Yamanashi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "There is provided a plasma processing method comprising: continuously introducing electromagnetic waves into a chamber of a plasma processing apparatus, the electromagnetic waves being VHF waves or UHF waves, the electromagnetic waves being introduced into the chamber so as to form standing waves within the chamber along a lower surface of an upper electrode of the plasma processing apparatus; periodically applying a negative voltage to...