ALEXANDRIA, Va., Feb. 24 -- United States Patent no. 12,562,344, issued on Feb. 24, was assigned to Tokyo Electron Ltd. (Tokyo).
"Plasma processing apparatus" was invented by Koki Hidaka (Miyagi, Japan), Koichi Kazama (Miyagi, Japan), Takanori Sato (Miyagi, Japan), Miyu Shihommatsu (Miyagi, Japan) and Takehiro Kato (Miyagi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing apparatus includes a plasma processing chamber; a substrate support; a lower electrode; an RF power supply; and an upper electrode assembly. The upper electrode assembly includes a gas diffusion plate; an insulating plate; and an upper electrode plate arranged between the gas diffusion plate and the insulating plate,...