US Patent Issued to Tokyo Electron on Feb. 24 for "Heat treatment apparatus and heat treatment method" (Japanese Inventors)

ALEXANDRIA, Va., Feb. 24 -- United States Patent no. 12,560,383, issued on Feb. 24, was assigned to Tokyo Electron Ltd. (Tokyo).

"Heat treatment apparatus and heat treatment method" was invented by Yasuhiro Kuga (Koshi, Japan) and Kazuhiko Ooshima (Koshi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A heat treatment apparatus includes a heating unit, a chamber, an exhaust unit, a partition unit and a switching unit. The heating unit supports and heats a substrate on which a film of a processing liquid is formed. The chamber surrounds the substrate supported by the heating unit. The exhaust unit is configured to discharge a gas from an inner space of the chamber through a discharge opening located nea...