ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,557,593, issued on Feb. 17, was assigned to Tokyo Electron Ltd. (Tokyo).
"Substrate processing apparatus" was invented by Masato Kadobe (Tokyo), Hiromi Nitadori (Iwate, Japan), Kaoru Sato (Iwate, Japan) and Kiyohiko Gokon (Iwate, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus includes a loading and unloading unit having a first side surface through which a container accommodating a substrate is loaded and unloaded, and a second side surface opposite to the first side surface, a substrate transport unit extending along a first horizontal direction perpendicular to the second side surface, and a plurality of batch pr...