US Patent Issued to Tokyo Electron on Feb. 17 for "Gas supply system, substrate processing apparatus, and operation method for gas supply system" (Japanese Inventor)

ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,553,132, issued on Feb. 17, was assigned to Tokyo Electron Ltd. (Tokyo).

"Gas supply system, substrate processing apparatus, and operation method for gas supply system" was invented by Eiichi Sugawara (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A disclosed gas supply system includes a gas supply line and a gas recovery line. The gas supply line supplies a heat transfer gas to a gap between a substrate support and a back surface of a substrate. The gas supply line includes first to third portions and a pressure controller. The second portion extends downstream of the first portion. The pressure controller regulates a pressure of the hea...