US Patent Issued to Tokyo Electron on Aug. 25 for "Substrate processing system and condition monitoring method" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,721,098, issued on Aug. 25, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate processing system and condition monitoring method" was invented by Toshiaki Kodama (Yamanashi, Japan) and Takeshi Niidome (Yamanashi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing system is provided with: a substrate processing apparatus including a loading/unloading port for a substrate and configured to execute predetermined processing on the substrate; a transfer device connected to the substrate processing apparatus via an opening/closing mechanism configured to open/close the loading/unloading port, and including a substrate transfer me...