US Patent Issued to Tokyo Electron on Aug. 25 for "Measurement method and substrate processing apparatus" (New York Inventor)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,716,840, issued on Aug. 25, was assigned to Tokyo Electron Ltd. (Tokyo).

"Measurement method and substrate processing apparatus" was invented by Yuji Otsuki (Albany, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A measurement method includes: a first measurement step of irradiating a prism with infrared light and measuring reflected light totally reflected by the prism; a second measurement step of irradiating the prism with infrared light while the prism is arranged on a substrate and measuring reflected light totally reflected by a surface of the prism on the substrate; and a calculation step of calculating an absorbance spectrum from an intensi...